这片science里面的插图,很令人费解,大家来讨论下?Fig. 1. Schematic of Ni/n-Si photoanode. (A) Structure of 2-nm Ni-coated n-Si anode (top) and proposed approximate energy band diagram (bottom). The ultrathin Ni/NiOx and the electrolyte form an effective layer interfacing with Si, affording a high built-in potential fs and photovoltage. (B) Structure of 5- to 20-nm Ni-coated n-Si anode (top) and a typical Ni/n-Si Schottky barrier formed between 5- to 20-nm Ni and n-Si, with built-in potential fs and photovoltage lower than the 2-nm Ni/n-Si case in (A).这个Ni层变厚了,费米能级为什么变高了,作者也没有给出证据和解释。文章中说内建电场可以使onset potential提前,但是肖特基能垒又使之后移,有没有互相矛盾。原文链接:http://www.sciencemag.org/content/342/6160/836.full查看更多2个回答 . 3人已关注